SemiPulse | AI-Powered Semiconductor Supply Chain Intelligence & Market Signals

Advanced Packaging Metrology System Market Innovation: - openPR.com

0.95

www.openpr.com 2026-07-10 openPR.com

Rigaku Opens "Rigaku Solutions Center Osaka" to Strengthen Global Semiconductor Metrology Service Capabilities - Morningstar

0.9

www.morningstar.com 2026-07-08 Morningstar

Inspection And Metrology Catching Up For High-Density Fan-Out Panel Packaging

0.92

semiengineering.com 2026-07-07 Anne Meixner

Optical methods need to comply with increasing warpage, finer RDL pitch, and trace size.

Semiconductor Packaging Panel-Level Packaging High-Density Fan-Out Inspection Technology Metrology Equipment AI Chips HPC Devices RDL Layers

+15% Growth in 2025: Metrology and Inspection Drive Semiconductor Innovation - Indiatimes

0.85

datacenters.economictimes.indiatimes.com 2026-06-30 Indiatimes

EVENT National Data Centers Summit 2026 ET DCNXT 2026–with the theme ‘Data Centres for an AI-first World’--is a one-day flagship event that will bring together the builders of infrastructure, enablers of AI, consumers of AI, capital allocators, and policy architects to answer one central question: Can India become the world’s AI infrastructure backbone through its data centres? Wed, 26 Aug 2026 Hy

Semiconductor Industry Metrology Innovation 2025 Forecast Semiconductor Manufacturing Technology Development Industry Growth Advanced Process

Nearfield Raises $380M to Advance AI-Era Semiconductor Metrology - Metrology and Quality News

0.92

metrology.news 2026-06-24 Metrology and Quality News

Nearfield Raises $380M to Advance AI-Era Semiconductor Metrology June 24, 2026 Nearfield Instruments, a leader in advanced semiconductor 3D metrology and process control, has announced the successful closure of a $380 million Series-D funding round. The transaction values the company at $1.6 billion, marking a major milestone in Nearfield’s development into a global leader in semiconductor metrol

Semiconductor Metrology AI Chips 3D Metrology EUV Lithography Chip Manufacturing Process Control Advanced Nodes Funding Round

Semiconductor Metrology Specialist Nearfield Instruments Secures $380M | Business | Jun 2026 - Photonics Spectra

0.85

www.photonics.com 2026-06-23 Photonics Spectra

www.photonics.com Performing security verification This website uses a security service to protect against malicious bots. This page is displayed while the website verifies you are not a bot. Ray ID: a10989d69aeec792 Performance and Security by Cloudflare Privacy

Semiconductor Metrology Photonics Detection Technology Semiconductor Equipment Technology Financing Nearfield Instruments 380 Million Dollars Semiconductor Industry

Nearfield Instruments raises US$380M in record Dutch deep-tech funding round

0.92

digitimes.com 2026-06-23

Dutch semiconductor metrology specialist Nearfield Instruments has secured US$380 million in Series D funding, marking the largest fundraising round ever completed by a deep-tech company in the Netherlands.

As Chips Go Vertical, Metrology Struggles to Keep Up

0.92

eetimes.com 2026-06-09

Chip technology dives deeper into the Z-axis, pushing metrology to innovate or risk becoming a bottleneck.

semiconductor manufacturing metrology 3D structures vertical integration EUV lithography CD-SEM atomic force microscopy nanoscale structures

Using Graph Attention for Virtual Metrology in Semiconductor Manufacturing (Intel Foundry, ASU) - Semiconductor Engineering

0.92

semiengineering.com 2026-06-03 Semiconductor Engineering

Researchers from Arizona State University and Intel Foundry have published “Graph Attention-Based Virtual Metrology for Film Deposition Processes in Semiconductor Manufacturing”. Abstract “Artificial intelligence-driven semiconductor manufacturing increasingly operates at nanometer and angstrom scales, where precise process control depends on accurate and timely metrology. However, physical metro

Virtual Metrology Graph Attention Mechanism Semiconductor Manufacturing Film Deposition Artificial Intelligence Equipment Sensor Data Process Control Process Optimization

Curvilinear Masks Push The Limits Of Inspection And Metrology

0.92

semiengineering.com 2026-05-27 Gregory Haley

As high-NA EUV approaches, mask makers need new metrics, model-based checks, and curvil...

Curvilinear masks Photomask Inspection technology Metrology EUV lithography High-NA EUV Mask data preparation Multi-beam writing

Rigaku Speeds Next-Gen Semiconductor Metrology Development - World Business Outlook

0.85

worldbusinessoutlook.com 2026-05-13 World Business Outlook

__fail__

Rigaku Accelerates Next-generation Semiconductor Metrology Development Leveraging World-Class Research Infrastructure – News Hub - Medianet News Hub

0.95