Semiconductor News & Analysis Feed

25 articles
2026-07-05
news.google.com 2026-07-05 IndexBox
2026-07-02
tech.yahoo.com 2026-07-02 Yahoo Tech
2026-07-02
tomshardware.com 2026-07-02 Anton Shilov
Intel begins expansion of its Bowers Campus in Santa Clara to produce more photomasks in-house, which is set to be crucial as process technologies get more sophisticated.
2026-06-25
bits-chips.com 2026-06-25 Bits&Chips
Headline Japanese researcher proposes simpler high-NA EUV optics design 25 June 2026 Paul van Gerven Editor at Bits&Chips Reading time: 1 minute A researcher at the Okinawa Institute of Science and Technology (OIST) has proposed a new optical architecture for high-NA EUV lithography. The approach replaces today’s highly complex optical layouts with a simpler in-line configuration that uses carefu
2026-06-24
www.digitaltoday.co.kr 2026-06-24 디지털투데이
Industry Intel buys ASML high-NA EUV lithography tool barred from China AI Summary Dutch chip equipment maker ASML has started shipping its next-generation high-NA EUV lithography tools to chip plants, with each unit costing $400 million. The system can achieve 8-nanometer resolution and draw finer circuits than existing EUV tools. Intel is the leading early customer after bringing in its first t
2026-06-22
www.indexbox.io 2026-06-22 IndexBox
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2026-06-22
semiengineering.com 2026-06-22 Semiconductor Engineering
Rising mask costs, tighter high-NA requirements, and new materials challenges are forcing chipmakers to weigh litho choices against volume, design strategy, and total process cost. Experts at the table: Semiconductor Engineering sat down to discuss new mask technology challenges with Aki Fujimura, CEO at D2S; Glen Scheid, operations manager at Micron; Harry Levinson, principal lithographer at HJL
2026-06-22
semiengineering.com 2026-06-22 Gregory Haley
Rising mask costs, tighter high-NA requirements, and new materials challenges are forci...
2026-06-20
www.tomshardware.com 2026-06-20 Tom's Hardware
Tech Industry Manufacturing Semiconductors Rare ASML Special Edition Monopoly board unearthed in social media trade — enthusiast swaps 2007 employee gift for High-NA EUV Lego kit News By Mark Tyson published 3 days ago No-cash deal looks set to go ahead, subject to regulatory approval, and no one changing their minds. (Image credit: Monopoly Fandom Wiki) Share this article 0 Join the conversat
2026-06-10
news.google.com 2026-06-10 AD HOC NEWS
2026-06-09
www.ad-hoc-news.de 2026-06-09 AD HOC NEWS
ASML, NL0010273215 High-NA EUV lithography scanner from ASML explained for US chip fabs 08.06.2026 - 22:40:25 | ad-hoc-news.de ASMLs High-NA EUV lithography scanner is one of the most complex tools in modern chipmaking. Here is how it works, why it matters for AI-era chips, and what US fabs need to know. ASML, NL0010273215 ASML High-NA EUV lithography system sits at the center of the next wave
2026-06-04
cryptobriefing.com 2026-06-04 Crypto Briefing
TSMC CEO outlines efforts to enhance cost-effectiveness of High-NA EUV The world's largest chipmaker is pumping the brakes on $400M-per-unit lithography tools, opting to squeeze more life out of curre
2026-06-04
www.trendforce.com 2026-06-04 TrendForce
[News] TSMC Rejects High-NA EUV Investment Concerns, Confirms Purchase for R&D Use 2026-06-04 Semiconductors editor News Please note that this article cites information from TechNews, Liberty Times, Tom’s Hardware, and Reuters. As Intel advances its High-NA EUV roadmap for its A14 node, market attention has turned to TSMC’s comparatively cautious approach to the cutting-edge lithography
2026-05-28
www.ad-hoc-news.de 2026-05-28 AD HOC NEWS
ASML, Presses ASML Presses Ahead with €16M Daily Buybacks as High-NA EUV Adoption Splits Chip Giants 28.05.2026 - 13:03:26 | boerse-global.de ASML continues aggressive share buyback, spending ~€16M daily, as High-NA EUV lithography splits customer base; Q1 revenue €8.8B, 2026 outlook €36-40B. ASML Presses Ahead with €16M Daily Buybacks as High-NA EUV Adoption Splits Chip Giants - Foto: über boer
2026-05-27
semiengineering.com 2026-05-27 Gregory Haley
As high-NA EUV approaches, mask makers need new metrics, model-based checks, and curvil...
2026-05-26
www.ad-hoc-news.de 2026-05-26 AD HOC NEWS
ASMLs, Taiwan ASML's Taiwan Hiring Spree and High-NA EUV Push Give Analyst Targets a Tangible Backing 25.05.2026 - 19:11:47 | boerse-global.de ASML accelerates Taiwan hiring to 1,000 as AI chip demand drives record revenue, stock up 44% YTD, and High-NA EUV lithography moves to volume production. ASML's Taiwan Hiring Spree and High-NA EUV Push Give Analyst Targets a Tangible Backing - Foto: über
2026-05-25
www.ad-hoc-news.de 2026-05-25 AD HOC NEWS
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2026-05-21
semiengineering.com 2026-05-21 Gregory Haley
Inspection limits, curvilinear adoption, data volumes, and high-NA EUV are converging t...
2026-05-21
www.techspot.com 2026-05-21 TechSpot
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2026-05-20
www.ad-hoc-news.de 2026-05-20 AD HOC NEWS
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