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Recent allegations from the U.S. government suggest that ASML, the Dutch manufacturer of advanced extreme ultraviolet (EUV) lithography systems, may have illegally transferred one of its most sophisticated systems to China. According to Bloomberg, U.S. Commerce Secretary Howard Lutnick raised the is

Researchers at the Okinawa Institute of Science and Technology (OIST) have proposed a novel high-numerical aperture (NA) extreme ultraviolet (EUV) lithography system that could transform semiconductor manufacturing. By redesigning the illumination and projection systems, this approach aims to overco