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As the semiconductor industry continues to advance toward smaller chip nodes, lithography technology faces unprecedented challenges. Recently, the international consortium Blue-X has begun exploring a novel lithography approach that could surpass current 13.5nm extreme ultraviolet (EUV) lithography,

Samsung Electronics is implementing a dual-track foundry strategy, accelerating its 2nm development for future customers while urging partners to boost sales of 5nm and 8nm processes to support near-term capacity utilization. This approach reflects the semiconductor industry's need to balance short-