Semiconductor News & Analysis Feed
20 articles
2026-08-13
www.digitimes.com
2026-08-13
Samsung Electronics plans to introduce high-numerical-aperture extreme ultraviolet (High-NA EUV) lithography into mass production at its 1nm node around 2030, according to South Korean media reports. This announcement underscores the semiconductor industry's ongoing pursuit of advanced manufacturing
2026-08-13
www.digitimes.com
2026-08-13
2026-08-13
www.digitimes.com
2026-08-13
SK Hynix is accelerating its next-generation DRAM production by advancing extreme ultraviolet (EUV) lithography adoption, with high-numerical-aperture (High-NA) EUV equipment scheduled for mass production in H2 2025. This strategic move represents a significant technological advancement in semicondu
2026-08-12
www.tomshardware.com
2026-08-12
2026-08-12
finance.biggo.com
2026-08-12
Samsung Electronics has delayed its adoption timeline for ASML's next-generation High-NA extreme ultraviolet lithography equipment, reserving the costly technology for its 1-nanometer chip manufacturing process expected around 2030. This strategic move aligns Samsung with competitor TSMC in adopting
2026-08-11
techgenyz.com
2026-08-11
Samsung is reportedly delaying the widespread adoption of High-NA EUV technology for its 1nm chip manufacturing until around 2030, aligning with its long-term roadmap rather than immediate advanced-node production. While High-NA EUV offers superior patterning capabilities compared to conventional EU
2026-08-11
www.kucoin.com
2026-08-11
At the 2026 Next-Generation Lithography + Patterning Academic Conference, Samsung confirmed that it plans to adopt High-NA EUV as its primary manufacturing technology starting from the 1nm (A10) node around 2030. Prior to this, nodes such as 2nm, 1.4nm, and early 1nm will continue to rely on 0.33 NA
2026-08-11
www.techpowerup.com
2026-08-11
Samsung has announced that the adoption of high numerical aperture (NA) EUV lithography for its 1nm node chips will be delayed until 2030. This decision highlights the technical and commercial challenges faced by Samsung in advancing chip manufacturing capabilities, especially amid intense competiti
2026-08-11
bits-chips.com
2026-08-11
2026-07-27
news.google.com
2026-07-27
2026-07-27
news.google.com
2026-07-27
2026-07-23
www.digitimes.com
2026-07-23
2026-07-21
www.digitimes.com
2026-07-21
2026-07-21
semiengineering.com
2026-07-21
2026-07-20
www.tradingview.com
2026-07-20
2026-07-17
finance.biggo.com
2026-07-17
The global semiconductor advanced process competition has reached a critical turning point. Intel has successfully integrated High-NA Extreme Ultraviolet (EUV) lithography into its 18A process, enabling mass production of its Core Ultra Series 3 processors, marking the world's first commercial appli
2026-07-17
www.igorslab.de
2026-07-17
Intel has announced that it has begun high-volume production of its Panther Lake processors using ASML's new high-numerical aperture (High-NA) EUV lithography technology—a significant step from lab testing to commercial production. While not all layers of the chips use the new technology, selected l
2026-07-16
futurumgroup.com
2026-07-16
2026-07-16
www.techrepublic.com
2026-07-16
2026-07-16
morethanmoore.substack.com
2026-07-16