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2026-05-27
Curvilinear Masks Push The Limits Of Inspection And Metrology
0.92
semiengineering.com
2026-05-27
Gregory Haley
As high-NA EUV approaches, mask makers need new metrics, model-based checks, and curvil...
Curvilinear masks
Photomask
Inspection technology
Metrology
EUV lithography
High-NA EUV
Mask data preparation
Multi-beam writing
1