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According to assessments by UBS and Zeiss, China remains 10–15 years away from developing domestic extreme ultraviolet (EUV) lithography, underscoring the persistent technological gap in chipmaking equipment. While China has made progress in deep ultraviolet (DUV) lithography, this advancement chall

According to assessments from UBS and Zeiss, China may remain 10–15 years away from developing domestic extreme ultraviolet (EUV) lithography, underscoring the persistent technological gap in replicating advanced chipmaking equipment. While China has made progress in deep ultraviolet (DUV) lithograp