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2026-07-15
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2026-07-15
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2026-07-15
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2026-07-15
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2026-07-15
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2026-07-15
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2026-07-15
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2026-07-15
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2026-07-15
ASML confirmed on July 15 that Intel Foundry has become the first company in the industry to ship a high-volume logic product manufactured using High-NA EUV lithography, marking a significant milestone in the commercial readiness of the Dutch equipment maker's most advanced lithography technology.
2026-07-05
news.google.com
2026-07-05
IndexBox
2026-07-02
tomshardware.com
2026-07-02
Anton Shilov
Intel begins expansion of its Bowers Campus in Santa Clara to produce more photomasks in-house, which is set to be crucial as process technologies get more sophisticated.
2026-07-02
tech.yahoo.com
2026-07-02
Yahoo Tech
TechComputing
Intel expands production of photomasks in California: EUV and High-NA EUV in the focal point
Tom's Hardware
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Thu, July 2, 2026 at 6:20 PM GMT+8
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Credit: Intel
Intel this week initiated expansion of its Bowers Campus in Santa Clara, California, i
2026-06-25
bits-chips.com
2026-06-25
Bits&Chips
Headline
Japanese researcher proposes simpler high-NA EUV optics design
25 June 2026
Paul van Gerven
Editor at Bits&Chips
Reading time: 1 minute
A researcher at the Okinawa Institute of Science and Technology (OIST) has proposed a new optical architecture for high-NA EUV lithography. The approach replaces today’s highly complex optical layouts with a simpler in-line configuration that uses carefu
2026-06-24
www.digitaltoday.co.kr
2026-06-24
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Industry
Intel buys ASML high-NA EUV lithography tool barred from China
AI Summary
Dutch chip equipment maker ASML has started shipping its next-generation high-NA EUV lithography tools to chip plants, with each unit costing $400 million. The system can achieve 8-nanometer resolution and draw finer circuits than existing EUV tools. Intel is the leading early customer after bringing in its first t
2026-06-22
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2026-06-22
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2026-06-22
semiengineering.com
2026-06-22
Semiconductor Engineering
Rising mask costs, tighter high-NA requirements, and new materials challenges are forcing chipmakers to weigh litho choices against volume, design strategy, and total process cost.
Experts at the table: Semiconductor Engineering sat down to discuss new mask technology challenges with Aki Fujimura, CEO at D2S; Glen Scheid, operations manager at Micron; Harry Levinson, principal lithographer at HJL
2026-06-22
semiengineering.com
2026-06-22
Gregory Haley
Rising mask costs, tighter high-NA requirements, and new materials challenges are forci...
2026-06-20
www.tomshardware.com
2026-06-20
Tom's Hardware
Tech Industry Manufacturing Semiconductors
Rare ASML Special Edition Monopoly board unearthed in social media trade — enthusiast swaps 2007 employee gift for High-NA EUV Lego kit
News
By Mark Tyson published 3 days ago
No-cash deal looks set to go ahead, subject to regulatory approval, and no one changing their minds.
(Image credit: Monopoly Fandom Wiki)
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2026-06-17
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17 JUN 2026 11:38 AM AEST
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New High-NA Lithography System to Transform Chipmaking
Okinawa Institute of Science and Technology Graduate University
From data centers powering next-generation AI, to vital medical technology, to cars, and to the very mobile device or computer that you're probably reading this on, semiconductor-based computer chips are essential for modern life.
As techn
2026-06-10
news.google.com
2026-06-10
AD HOC NEWS
2026-06-09
www.ad-hoc-news.de
2026-06-09
AD HOC NEWS
ASML, NL0010273215
High-NA EUV lithography scanner from ASML explained for US chip fabs
08.06.2026 - 22:40:25 | ad-hoc-news.de
ASMLs High-NA EUV lithography scanner is one of the most complex tools in modern chipmaking. Here is how it works, why it matters for AI-era chips, and what US fabs need to know.
ASML, NL0010273215
ASML High-NA EUV lithography system sits at the center of the next wave
2026-06-04
cryptobriefing.com
2026-06-04
Crypto Briefing
TSMC CEO outlines efforts to enhance cost-effectiveness of High-NA EUV
The world's largest chipmaker is pumping the brakes on $400M-per-unit lithography tools, opting to squeeze more life out of curre