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South Korea's semiconductor equipment supply chain saw a material pickup in orders in the first half of 2026 as Samsung Electronics and SK Hynix accelerated investment in advanced DRAM and high-bandwidth memory (HBM4), generating demand across front-end tools, advanced packaging, and inspection equipment. The shift toward high-end process and packaging capabilities for AI memory has driven new con

Chunghwa Leading Photonics Tech, a subsidiary of Chunghwa Telecom, is set to list on the Taipei Emerging Stock Board. The company has recorded record-high revenue and gross margin in the first four months of 2026, boosted by rising demand in Industry 5.0 applications, advanced semiconductor process inspection, and AI data center optical communication. With short-wave infrared (SWIR) transmissive a

Sony Semiconductor Solutions to Release X-ray CMOS Sensor with Industry's Fastest(*1) Imaging and Low-Noise Performance for Inspection and Measurement Instrumentation NEWS PROVIDED BY Sony Electronics, Inc. Jun 08, 2026, 22:00 ET SHARE THIS ARTICLE High-accuracy energy measurements and photon-level data acquisition on a single chip ATSUGI, Japan, June 8, 2026 /PRNewswire/ -- Sony Semico

Majority of AI initiatives failing; synthetic data gaining traction due to limited real...

Vadzo Imaging Announces NIR LED Array Board Integration Service for Uniform Illumination in Biometric, Inspection, and Day-Night Vision Applications PRESS RELEASE • JUN 3, 2026 16:00 UTC Vadzo Imaging introduces an OEM engineering program that combines precision configured NIR LED array boards with a portfolio of monochrome NIR camera products spanning MIPI, USB 3.0 and GigE interfaces. The servi

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Innometri signs a memorandum of understanding with LaserCell to jointly develop non-destructive semiconductor inspection equipment. (Photo: Innometri) Innometri said it signed a memorandum of understanding with LaserCell to jointly develop non-destructive semiconductor inspection equipment. The two companies will cooperate on developing X-ray and computed tomography (CT) systems capable of inspe

As high-NA EUV approaches, mask makers need new metrics, model-based checks, and curvil...

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Inspection limits, curvilinear adoption, data volumes, and high-NA EUV are converging t...

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