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The UNIST study on tin-based EUV photoresists represents a meaningful step in extending extreme ultraviolet lithography beyond its current performance envelope. The key insight—that ligand chemistry, not merely tin loading, governs the sensitivity-precision trade-off—opens a new design dimension for

Japanese paper giant Oji Holdings Corp has drawn investor attention after reports that it has developed extreme ultraviolet (EUV) photoresist for 2nm semiconductor chips, marking a significant shift from its traditional paper business toward advanced materials. According to a TrendForce report dated