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2026-05-27
Curvilinear Masks Push The Limits Of Inspection And Metrology
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semiengineering.com 2026-05-27 Gregory Haley
As high-NA EUV approaches, mask makers need new metrics, model-based checks, and curvil...
Curvilinear masksPhotomaskInspection technologyMetrologyEUV lithographyHigh-NA EUVMask data preparationMulti-beam writing