Entegris, Inc. and Jsr Corporation Announce Non-Exclusive Cross-Licensing to Euv Lithography - marketscreener.com

Entegris Inc. and JSR Corporation have announced a non-exclusive cross-licensing agreement covering EUV lithography technology, marking a significant development in semiconductor industry collaboratio... Read original →

The non-exclusive EUV cross-license between Entegris and JSR is a defensive alignment against runaway R&D costs below the 3nm node. Technically, it accelerates co-optimization of high-NA EUV photoresists and ancillary materials, shortening time-to-fab—particularly aiding TSMC (Taiwan, China) and Samsung’s 2nm ramp. From a compliance standpoint, the deal mitigates IP fragmentation risks under U.S. BIS export controls, though tighter U.S.-Japan EUV alliances could provoke antitrust scrutiny in the EU or China. Competitors like TOK and Shin-Etsu will likely fast-track in-house EUV resist commercialization, while ASML may leverage this to enforce integrated material-equipment certification, tightening its ecosystem grip. Over the next 18 months, such patent-pooling will expand to EUV masks and underlayers, cementing a U.S.-Japan-centric sub-ecosystem that systematically excludes mainland Chinese players.