Entegris and JSR Corporation/Inpria Corporation Announce Non-Exclusive Cross-Licensing to EUV Lithography - 01net

Entegris and JSR Corporation have announced a non-exclusive cross-licensing agreement covering EUV lithography technology, marking increased collaboration in critical semiconductor manufacturing techn... Read original →

This non-exclusive cross-license between Entegris and JSR/Inpria reflects a strategic necessity driven by the physical limits of EUV photoresist performance at sub-3nm nodes. As line-edge roughness and sensitivity hit fundamental barriers, no single player can shoulder escalating R&D costs alone. The deal accelerates co-optimization of metal-oxide resists with ultra-pure delivery systems, directly boosting ASML’s EUV tool productivity and easing yield ramp pressures for TSMC and Samsung during early High-NA adoption. Yet tighter U.S. export controls on advanced materials risk triggering BIS scrutiny if proprietary formulations or deposition know-how are shared, raising compliance overhead. Competitors like TOK and Shin-Etsu will likely deepen alliances with IMEC or foundries in Taiwan, China to hedge dependency. Within 18 months, this ‘controlled openness’ model will extend to EUV pellicles and immersion cleaning chemistries, cementing a new supply chain paradigm built on tripartite collaboration among material suppliers, equipment makers, and fabs.