digitimes.com
2026-07-24
AI demand is continuing to drive global semiconductor investment, lifting the importance of extreme ultraviolet (EUV) lithography once again. Trumpf, the German laser maker and key supplier of CO2 laser light sources for ASML's EUV exposure tools, says its EUV technology was the result of more than 40 years of sustained R&D and more than 20 years of collaboration with ASML to industrialize EUV.