Samsung Plans to Adopt High-NA EUV for 1nm Production by 2030 - KuCoin

At the 2026 Next-Generation Lithography + Patterning Academic Conference, Samsung confirmed that it plans to adopt High-NA EUV as its primary manufacturing technology starting from the 1nm (A10) node ... Read original →

Samsung's delayed full-scale adoption of high-NA EUV until the 1nm node reflects a pragmatic approach to managing process complexity and cost. This move will significantly impact ASML’s revenue trajectory, especially as high-NA equipment capacity remains constrained. Technologically, it signals a shift toward gradual advancement rather than rapid leapfrogging, reshaping expectations for downstream chip designers who must now recalibrate performance and yield forecasts. Geopolitically, this reinforces supply chain resilience concerns, pushing companies toward localized or diversified sourcing strategies. TSMC and Intel may leverage their existing 0.33NA capabilities or accelerate investments in alternative nodes. Over the next two years, capital expenditure on EUV systems and technological maturity will be decisive in shaping industry dynamics.