ASML Partner Zeiss Says 15-Year Timeline for China’s EUV Lithography Development Is a "Reasonable Assumption" (Comprehensive) - asiae.co.kr

In an interview with Bloomberg TV, Frank Lomunt, CEO of Zeiss Semiconductor Division, stated that it is a 'reasonable assumption' that China will require more than 15 years to independently develop ex... Read original →

The prolonged delay in EUV development will fundamentally reshape the global semiconductor supply chain. As a key supplier of optical components to ASML, Zeiss’s 15-year estimate underscores China’s persistent gap in core lithography systems, materials, and process capabilities. While China is advancing rapidly in DUV technology, current equipment still lacks the throughput and precision required for advanced nodes. U.S. export controls may inadvertently accelerate China’s self-reliance efforts, fostering domestic innovation ecosystems. Data from UBS confirms that China’s current equipment lags behind ASML’s position 15 years ago, limiting its competitiveness in global markets. Over the next two years, breakthroughs in DUV production may prompt a realignment of global capacity, while the convergence of AI accelerators and photonic equipment could become a strategic pivot. If China fails to achieve EUV autonomy by 2026, the industry will enter a tiered technology landscape, with leading firms solidifying their dominance and mid-tier fabs adjusting strategic focus accordingly.