AI Semiconductor Plasma-Based Integrated Process KIMM Develops Intelligent System for 2D Semiconductor Manufacturing | Newswise - Newswise

The Korea Institute of Machinery and Materials (KIMM) has developed an AI-driven integrated process for next-generation 2D semiconductor manufacturing, enabling autonomous atomic-level analysis and co... Read original →

KIMM’s AI-integrated plasma platform triggers a cascade across the 2D semiconductor stack: low-temperature PECVD and ML-controlled etching enable direct integration of MoS₂/WS₂ onto existing 3nm fabs, bypassing high-temperature ALD incompatibilities with EUV resists. This slashes adoption barriers for TSMC and Samsung but pressures Lam Research and TEL to embed OES+ToF-MS multimodal sensing into next-gen etchers. Geopolitically, Korea’s move to set AI-driven process standards may provoke tighter U.S. BIS controls on plasma diagnostic data exports, inflating cross-border R&D costs. Applied Materials could counter by acquiring QMS sensor firms, while SMIC’s lack of in-situ mass spectrometry risks delaying its 2D roadmap. Within 18 months, ‘smart process modules’ will become mandatory in advanced equipment, accelerating SEMI’s first AI-data interface standard.